Beamline Aplications
Techniques using SR: Angle-Resolved photoemission Spectroscopy (ARPES)
Soft X-ray Angle-integrated Photoemission Spectroscopy (SXPS)
Soft X-ray Absorption Spectroscopy in the total electron yield mode (SXAS)
Photoemission Electron Microscopy (PEEM)
Applications: Surface-sensitive electronic structural investigation of materials
Radiation source: A planar Halbach-type undulator (Danfysik)
Magnetic field: 0.5467 T at 26.5 mm of gap
Period length: 60 mm
Number of periods: 41
Total length: 2.460 m
Photon energy ranges: 40-160 and 220-1040 eV
Energy resolution: 1E-4 @1E10 ph./s
Optical Beamline Layout
Schematic of BL3.2U optical layout

PES

VLSPG
PEEM
XPS
S2
S1
M0
Source Description: The beamline utilizes a Planar Halbach-type Undulator manufactured by Danfysik. This insertion device features a pure permanent magnet (PPM) structure arranged in a planar Halbach configuration. By forcing the electron beam into a periodic sinusoidal trajectory, it generates high-intensity, nonpolarized synchrotron radiation. The photon energy is fully tunable by mechanically varying the undulator gap, providing a continuous spectrum of high-flux photons optimized for the soft X-ray and VUV regions.
The Monochromator: The beamline employs a Varied Line Spacing Plane Grating (VLSPG) Monochromator manufactured by TOYAMA. This system features a set of three interchangeable Laminar Holographic Gratings on a single-crystal silicon substrate that can select a photon energy in the range 40-1040 eV. The beam passes through the entrance slit (S1) into VLSPG, producing a monochromatic beam that exits through the exit slit (S2). The entrance and exit slit can adjust a width in the range 0.05 to 0.5 mm, which has a direct effect on the beam spot size on the sample. The use of Laminar (rectangular) groove profiles effectively suppresses higher-order harmonic contamination, providing exceptional spectral purity for quantitative spectroscopy.
Specification Sheet of Optical System


